0/-1 order Phase masks (NFH)

      Phase masks are the production tool used to write gratings in fibers and waveguides. Ibsen Phase masks incorporate unbeatable, interferometric (holographic) patterning technology into a production friendly Phase mask.

      – for cost-effective fabrication of very low period gratings, typically in high refractive index materials

      Low-cost production of gratings on planar wafers can be accomplished by use of the Nearfield Holography (NFH) technique, which employs a special type of Phase mask. The Phase mask is made for easy use in a specially modified mask aligner (commercially available from Suss MicroTec) with a conventional UV source as illumination. This technology has distinct production advantages over grating fabrication by direct holography or direct e-beam technology. In addition of fabrication of gratings on semiconductor DFB lasers, the technique is also advantageous in a number of other fine-pitch applications within the telecommunications and sensor industries.

      Sample applications include:

      • DFB lasers
      • DBR lasers
      • Integrated planar optics
      • Sensors
      • Biochips

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